三氯化铁除砷和镉的机理

doi:10.3969/j.issn.0438-1157.2014.10.048

化工学报 ›› 2014, Vol. 65 ›› Issue (10): 4118-4122.DOI: 10.3969/j.issn.0438-1157.2014.10.048

三氯化铁除砷和镉的机理

郭莉, 赵燕鹏, 杜冬云

中南民族大学化学与材料科学学院, 催化材料科学国家民委-教育部共建重点实验室, 湖北武汉 430074

收稿日期:2014-02-18 修回日期:2014-04-09 出版日期:2014-10-05 发布日期:2014-10-05
通讯作者: 杜冬云
基金资助:
武汉市重点科技攻关资助项目（201160638171）。

Mechanism of removing arsenic and cadmium with ferric chloride

GUO Li, ZHAO Yanpeng, DU Dongyun

School of Chemistry and Material Science, Key Laboratory of Catalysis and Materials Science of the State Ethnic Affairs Commission & Ministry of Education, South Central University for Nationalities, Wuhan 430074, Hubei, China

Received:2014-02-18 Revised:2014-04-09 Online:2014-10-05 Published:2014-10-05
Supported by:
supported by Wuhan Science and Technology Key Projects Fund (201160638171).

摘要/Abstract

摘要： 采用电荷分布多位络合模型模拟（CD-MUSIC）、XPS、FTIR和Zeta电位分析的方法研究了三氯化铁去除As（Ⅴ）、Cd（Ⅱ）的机理。结果表明：在pH 3～7范围内，砷、镉通过竞争铁氧化物表面的有效作用位点而相互抑制；而在pH 7～10范围内，Cd（Ⅱ）主要以Cd（OH）₂沉淀的方式得以去除，并通过共沉淀作用促进砷的去除。根据CD-MUSIC 模拟结果，As（Ⅴ）主要形成单齿单核质子化（FeOAsO₃H^1.5-、FeOAsO（H₂O）₂^0.5-）的表面配合物，结合常数分别为63.04、66.50；而 Cd（Ⅱ）则以 FeOHCd^1.5+形态结合在铁氧化物的表面，结合常数为31.05，其含量随着pH的升高逐渐减少。

关键词: 三氯化铁, 砷、镉去除机理, 电荷分布多位络合模型

Abstract: The mechanism of arsenic and cadmium removal withferric chloride was studied by analysis of residue samples with CD-MUSIC, XPS, FTIR and Zeta potential. There was interference between As and Cd by competing the active site on iron oxide in the range of pH at 3-7. Nevertheless, in the range of pH at 7-10, Cd(Ⅱ) was mainly removed by precipitation as Cd(OH)₂, which could increase As removal by co-precipitation. According to the results simulated with CD-MUSIC, As(Ⅴ) was mainly removed by forming monodentate uninuclear surface complexes ( FeOAsO₃H^1.5- and FeOAsO(H₂O)₂^0.5-), with binding constants of 63.04 and 66.50 respectively. Besides, Cd(Ⅱ) was combined on the surface of ferriferrous oxide with the formation of FeOHCd^1.5+ with binding constant of 31.05 and the amount of this complex decreased with rising pH.

Key words: ferric chloride, mechanism of arsenic and cadmium, CD-MUSIC

中图分类号:

X781

郭莉, 赵燕鹏, 杜冬云. 三氯化铁除砷和镉的机理[J]. 化工学报, 2014, 65(10): 4118-4122.

GUO Li, ZHAO Yanpeng, DU Dongyun. Mechanism of removing arsenic and cadmium with ferric chloride[J]. CIESC Journal, 2014, 65(10): 4118-4122.

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三氯化铁除砷和镉的机理

Mechanism of removing arsenic and cadmium with ferric chloride

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