CIESC Journal

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电沉积Ni-W梯度镀层及其结构表征

王宏智; 姚素薇; 张卫国   

  1. School of Chemical Engineering and Technology, Tianjin University, Tianjin 300072, China
  • 收稿日期:1900-01-01 修回日期:1900-01-01 出版日期:2003-06-28 发布日期:2003-06-28
  • 通讯作者: 王宏智

Electrochemical Deposition of Ni-W Gradient Deposit and Its Structural Characterization

WANG Hongzhi; YAO Suwei; ZHANG Weiguo   

  1. School of Chemical Engineering and Technology, Tianjin University, Tianjin 300072, China
  • Received:1900-01-01 Revised:1900-01-01 Online:2003-06-28 Published:2003-06-28
  • Contact: WANG Hongzhi

摘要: The Ni-W gradient deposit with nano-structure was prepared by an electrochemical deposition
method.X-ray diffraction (XRD) and energy dispersive X-ray analysis (EDXA) indicate that
the crystallite size of the depositdecreases from 10.3nm to 1.5nm and the crystal grating
aberrance increases with the increase of W content in thegrowing direction of the deposit.
The structure of deposit changes from crystalline to amorphous stepwise withassociated
increase of crystal grating aberrance, and presents gradient distribution. These show that
the deposit isgradient with nano-structure.

关键词: electrochemical deposition;Ni-W alloy;FGM;amorphous

Abstract: The Ni-W gradient deposit with nano-structure was prepared by an electrochemical deposition
method.X-ray diffraction (XRD) and energy dispersive X-ray analysis (EDXA) indicate that
the crystallite size of the depositdecreases from 10.3nm to 1.5nm and the crystal grating
aberrance increases with the increase of W content in thegrowing direction of the deposit.
The structure of deposit changes from crystalline to amorphous stepwise withassociated
increase of crystal grating aberrance, and presents gradient distribution. These show that
the deposit isgradient with nano-structure.

Key words: electrochemical deposition, Ni-W alloy, FGM, amorphous