CIESC Journal ›› 2004, Vol. 55 ›› Issue (4): 659-663.

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MECHANISM OF FILM FORMING FOR IMIDAZOLE AND ITS DERIVATIVES ON SURFACE OF COPPER

ZHAO Yongsheng;PANG Zhengzhi;LU Yanhua   

  • Online:2004-04-25 Published:2004-04-25

咪唑化合物在铜表面的成膜机理

赵永生;庞正智;卢艳华   

  1. 北京化工大学材料科学与工程学院,北京 100029

Abstract: The UV absorbances of Cu (Ⅱ) analog complexes prepared with imidazole and several derivatives were determined, on the basis of which the structures of the analog complexes and the coordination agent-coordination center ratios of the complexes were obtained. The structures of the films formed by imidazole compounds on the surface of copper were determined by using XPS.The mechanism of film forming for imidazole and its derivatives on the surface of copper was developed by means of comparing the structures of the films and those of the analog complexes.

Key words: 咪唑, 铜, 表面处理, 成膜

关键词: 咪唑, 铜, 表面处理, 成膜