Advances of supercritical fluid anti-solvent technology and particle formation mechanism

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Advances of supercritical fluid anti-solvent technology and particle formation mechanism

HUANG Pan1，2，JIANG Haoxi1，2，3，4，LI Shichang4，ZHANG Minhua1，2

1R&D Center for Petrochemical Technology，Tianjin University，Tianjin 300072，China；2 Key Laboratory for Green Chemical Technology of Ministry of Education，Tianjin University，Tianjin 300072，China；3 Post-Doctor Station for Science and Technology of Chemical Engineering and Technology，Tianjin University，Tianjin 300072，China；4 Post-Doctor Workstation for Science and Technology，Shandong Haihua Group Co. Ltd， Weifang 262737，Shandong，China

Online:2011-10-20 Published:2011-10-05

超临界流体抗溶剂技术及微粒成形机理的研究进展

黄盼1，2，姜浩锡1，2，3，4，李仕昌4，张敏华1，2

1天津大学石油化工技术开发中心，天津 300072；2天津大学绿色合成与转化教育部重点实验室，天津 300072；3天津大学化学工程与技术博士后科研流动站，天津30072；4山东海化集团博士后科研工作站，山东潍坊 262737

Abstract

Abstract:

Supercritical anti-solvent（SAS）technology is a novel technique for the preparation of micro- and nano-particles，and has been largely applied in pharmaceuticals，superconductors，coloring matters，explosives and polymers. The supercritical anti-solvent process and its application in the preparation of single and multi-composition inorganic oxide nanoparticles were reviewed. The particle formation mechanism in the SAS process was summarized. The future development of the SAS technology was also proposed.

摘要：

超临界抗溶剂技术是一种新型的超细微粒制备技术，在药物、超导、颜料、炸药和聚合物等领域已有广泛的应用。本文主要介绍了超临界抗溶剂过程和该技术在单组分和多组分无机氧化物纳米粒子制备上的应用，并对超临界抗溶剂微粒成形机理的研究现状和微粒的成形机理进行了简要的概括总结。最后对超临界抗溶剂微粒化技术的发展做了进一步展望。

HUANG Pan1，2，JIANG Haoxi1，2，3，4，LI Shichang4，ZHANG Minhua1，2. Advances of supercritical fluid anti-solvent technology and particle formation mechanism[J]. .

黄盼1，2，姜浩锡1，2，3，4，李仕昌4，张敏华1，2. 超临界流体抗溶剂技术及微粒成形机理的研究进展[J]. CIESC Journal.