Abstract: The process of Chemical Vapor Deposition (CVD) coating was investigated in the rotating reactor. Base on this ,TiO2 was coated on A12O3 particles by using hydrolysis reaction of Ti(OC4H9)4, and the mechanism of the coating process was studied. The results indicated that : (1) The coating film of TiO2 on A12O3 was compactness and uniform, and the coating quantity of TiO2 was about 0. 1%-10%; (2) The coated TiO2 was amorophous at low reaction temperature and was anatase at reaction temperature higher than 673K, the amorophous TiO2 could be translated to anatase by high temperature heat treatment; (3) Nucleation and film formation co - existed in the coating process, and nucleation could be promoted by controlling the concentration of reactant.

摘要： 探讨了回转炉化学气相淀积（CVD）包覆新工艺,利用Ti（OC_4H_9）_4水解,在Al_2O_3粒子表面实现了TiO_2包覆,研究了包覆过程特征。结果表明,TiO_2在Al_2O_3粒子表面的包覆是成功的,并具有一定的致密性,包覆量为0.1%～10%;化学气相包覆过程中既存在成膜包覆,又存在成核包覆,通过控制反应物浓度等方法可以强化成膜包覆,提高包覆效果。