×
模态框（Modal）标题
在这里添加一些文本
Close
Close
Submit
Cancel
Confirm
×
模态框（Modal）标题
×
Fig/Tab
Rss
Email Alert
Adv Search
Home
About Journal
Editorial Board
Publishing Ethics
Subscriptions
Advertise
Contact Us
Download
中文
Introduction
Indexed-in
Journal Metrics
Kinetics of 3D NAND flash wet etching with phosphoric acid under the influence of H
2
SiO
3
Zilin PENG, Lei ZHOU, Qinghang DENG, Guanghua YE, Xinggui ZHOU
CIESC Journal . 2025, (
2
): 645 -653 . DOI: 10.11949/0438-1157.20240709
