Abstract: The condition of amorphous formation of Ni - W electrodeposition was studied , and the structure area of amorphous and crystalline was drawn out. A displacement solid solution made up of solvent Ni and solute W was determined by X -ray diffraction experiment. The solid solution has a f. c. c structure. The formation of amorphous deposit was explained by calculating the change of lattice constant, crystal grain size and its change with the change of structure. Furthermore, the corrosion rate of amorphous deposit in acid medium was tested. The chemical formula of passivated film was Ni(OH)2·WO3·nH2O by XPS analysis.

摘要： 研究电沉积Ni-W合金的非晶化条件,划分出结晶与非晶结构区。由X衍射实验判定,Ni-W合金镀层足以Ni为溶剂、W为济质的置换型固溶体,呈面心立方结构。通过计算晶格畸变度、晶粒直径及其随结构的变化,解释了非晶镀层的形成原因。测定了作品镀层在酸溶液中的腐蚀速率,用X射线光电子能谱仪(XPS)对其在酸溶液中形成的钝化膜进行了测试,钝化膜的化学结构式为i(OH)_2·WO_3、·nH_2O。