Abstract:

The electrochemical behavior of m-NO₂C₆ H₄SO₃ Na on Cu electrode is investigated in DMF（TBAP），H2O and DMF/H₂O（TBAP） mediaThe working electrode was a Cu electrode，the auxiliary electrode was a large area platinum wire，and the reference electrode was a saturated calomel electrodeIt was shown that the reaction of m-NO₂C₆H₄SO3Na on Cu electrode would undergo two steps in which ArNO₂/ArNO^-₂·was a reversible process controlled by the diffusion of m-NO₂C₆H₄ SO₃ Na in aprotic mediumIn protic medium，the electrochemical reduction of m-NO₂C₆H₄SO₃Na would undergo two steps of oxidation-reduction reaction of ArNO₂/ArNO and ArNO/ArNHOHWhile in mixed medium，due to the hindrance of protonation by DMF，m-NO₂C₆H₄SO₃Na was firstly reduced to ArNO^-₂· and further reduced to ArNHOHThese results could be interpreted by the calculation of qauntum

Key words:

间硝基苯磺酸钠, 铜电极, 质子惰性介质, 质子介质, 混合介质, 量化计算

摘要：

研究了铜电极上间硝基苯磺酸钠在含有四丁基高氯酸铵（TBAP）电解质的质子惰性介质（DMF）、质子介质（H₂O）及混合介质（DMF/H₂O）中的电化学行为。结果表明：在质子惰性介质中，间硝基苯磺酸钠分步连续地被还原为ArNO^-₂·和［ArNO²］^2-·阴离子自由基;其中ArNO₂/ArNO^-₂·为扩散控制的单电子转移可逆氧化还原反应。在水溶液中，间硝基苯磺酸钠经历了ArNO₂/ArNO和ArNO/ArNHOH反应。而在混合溶剂中，由于DMF的存在阻碍了硝基的质子化进程，间硝基苯磺酸钠经历了ArNO₂/ArNO^-₂·和ArNO-2·/ArNHOH反应。通过量化计算进一步证实了上述实验结果。

关键词:

间硝基苯磺酸钠, 铜电极, 质子惰性介质, 质子介质, 混合介质, 量化计算