CIESC Journal ›› 2022, Vol. 73 ›› Issue (1): 73-84.DOI: 10.11949/0438-1157.20210866

• Reviews and monographs • Previous Articles     Next Articles

Research advances in preparation technology and quality of silicon nitride powder

Maoqiao XIANG1(),Yuqi GENG1,2,Qingshan ZHU1,2()   

  1. 1.State Key Laboratory of Multi-phase Complex Systems, Institute of Process Engineering, Chinese Academy of Sciences, Beijing 100190, China
    2.School of Chemical Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
  • Received:2021-06-28 Revised:2021-11-02 Online:2022-01-18 Published:2022-01-05
  • Contact: Qingshan ZHU

氮化硅粉体制备技术及粉体质量研究进展

向茂乔1(),耿玉琦1,2,朱庆山1,2()   

  1. 1.中国科学院过程工程研究所多相复杂系统国家重点实验室,北京 100190
    2.中国科学院大学化学工程学院,北京 100049
  • 通讯作者: 朱庆山
  • 作者简介:向茂乔(1987—),男,博士,青年研究员,mqixang@ipe.ac.cn
  • 基金资助:
    中国科学院青年创新促进会人才项目(292021000085);南京绿色制造产业创新研究院重大项目(E0010708)

Abstract:

Silicon nitride (Si3N4) has excellent physical and chemical properties and occupies an important position in key fields such as national defense and electronic information. High quality Si3N4 powders are the primary prerequisite for the preparation of high performance Si3N4 ceramics. The high-quality powder requisites the conditions of fine particle size with narrow distribution, high α phase, low impurity and so on. The research advances in preparation technology of silicon nitride powder are summarized from the point of the synthesis reaction system, with the emphasis on summarizing the progress of the improvement of powder quality by enhancing heat and mass transfer. In addition, the present situations of industrial manufacture are introduced, and the development trend and direction of the preparation technology of high quality Si3N4 powder are also prospected.

Key words: silicon nitride, powder technology, carbo-thermal nitriding method, silicon directly nitriding method, chemical vapor deposition method, silamine precursor conversion method, synthesis mechanism

摘要:

氮化硅(Si3N4)具有优异的物化性能,在国防、电子信息等关键领域都占据重要的地位。高质量粉体是制备高性能Si3N4陶瓷的首要前提。通常高质量Si3N4粉体需要满足粒径细、分布窄、α相含量高、杂质含量低等条件。基于合成反应体系综述了当前国内外制备Si3N4粉体的方法,着重从强化传热与传质角度介绍了改善粉体质量的研究进展,并介绍了当前工业生产现状,展望了高质量Si3N4粉体制备技术的发展趋势和方向。

关键词: 氮化硅, 粉体技术, 碳热氮化法, 硅粉直接氮化法, 化学气相沉积法, 硅胺前体转化法, 合成机理

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