CIESC Journal ›› 2025, Vol. 76 ›› Issue (5): 2270-2278.DOI: 10.11949/0438-1157.20241258
• Separation engineering • Previous Articles Next Articles
Zhenguang TUO1,2(
), Rongliang LI3, Shaohui KANG3, Yuqing NIU3, Zhiquan ZHOU3, Kaikai YE3, Haitao MA1,4, Shun LIU1,2, Hong LI1,2, Xin GAO1,2(
)
Received:2024-11-08
Revised:2025-03-04
Online:2025-06-13
Published:2025-05-25
Contact:
Xin GAO
拓振光1,2(
), 李荣亮3, 康绍辉3, 牛玉清3, 周志全3, 叶开凯3, 马海桃1,4, 刘顺1,2, 李洪1,2, 高鑫1,2(
)
通讯作者:
高鑫
作者简介:拓振光(2000—),男,硕士研究生,1803154475 @qq.com
基金资助:CLC Number:
Zhenguang TUO, Rongliang LI, Shaohui KANG, Yuqing NIU, Zhiquan ZHOU, Kaikai YE, Haitao MA, Shun LIU, Hong LI, Xin GAO. Error analysis and correction of vapor-liquid equilibrium of WF6-MoF6 systems by static method[J]. CIESC Journal, 2025, 76(5): 2270-2278.
拓振光, 李荣亮, 康绍辉, 牛玉清, 周志全, 叶开凯, 马海桃, 刘顺, 李洪, 高鑫. 静态法测定WF6-MoF6体系汽液相平衡数据的误差分析与修正[J]. 化工学报, 2025, 76(5): 2270-2278.
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| 试剂名称 | 化学式 | 供应商 | 质量分数/% |
|---|---|---|---|
| 六氟化钼 | MoF6 | 山东重山光电材料股份有限公司 | ≥99.9 |
| 六氟化钨 | WF6 | 山东重山光电材料股份有限公司 | ≥99.9 |
| 五氟化钒 | VF5 | 山东重山光电材料股份有限公司 | ≥99.9 |
| 氮气 | N2 | 山东重山光电材料股份有限公司 | ≥99.999 |
| 液氮 | N2 | 山东重山光电材料股份有限公司 | ≥98 |
| 纯净水 | H2O | 山东重山光电材料股份有限公司 | 100 |
Table 1 Experimental reagent information
| 试剂名称 | 化学式 | 供应商 | 质量分数/% |
|---|---|---|---|
| 六氟化钼 | MoF6 | 山东重山光电材料股份有限公司 | ≥99.9 |
| 六氟化钨 | WF6 | 山东重山光电材料股份有限公司 | ≥99.9 |
| 五氟化钒 | VF5 | 山东重山光电材料股份有限公司 | ≥99.9 |
| 氮气 | N2 | 山东重山光电材料股份有限公司 | ≥99.999 |
| 液氮 | N2 | 山东重山光电材料股份有限公司 | ≥98 |
| 纯净水 | H2O | 山东重山光电材料股份有限公司 | 100 |
| F/mol | L/mol | G/mol | xF | xL | xG | (xL-xF)×100% |
|---|---|---|---|---|---|---|
| 1.0105 | 0.9913 | 0.0192 | 0.1677 | 0.1701 | 0.0466 | 0.24% |
| 1.0052 | 0.9861 | 0.0192 | 0.3347 | 0.3373 | 0.2000 | 0.26% |
| 0.9942 | 0.9750 | 0.0192 | 0.5057 | 0.5107 | 0.2518 | 0.50% |
| 1.0033 | 0.9841 | 0.0192 | 0.6678 | 0.6733 | 0.3873 | 0.55% |
| 0.8976 | 0.8784 | 0.0192 | 0.8341 | 0.8379 | 0.6623 | 0.38% |
Table 2 Feed parameters of MoF6-WF6 binary mixture vapor-liquid equilibrium experiment
| F/mol | L/mol | G/mol | xF | xL | xG | (xL-xF)×100% |
|---|---|---|---|---|---|---|
| 1.0105 | 0.9913 | 0.0192 | 0.1677 | 0.1701 | 0.0466 | 0.24% |
| 1.0052 | 0.9861 | 0.0192 | 0.3347 | 0.3373 | 0.2000 | 0.26% |
| 0.9942 | 0.9750 | 0.0192 | 0.5057 | 0.5107 | 0.2518 | 0.50% |
| 1.0033 | 0.9841 | 0.0192 | 0.6678 | 0.6733 | 0.3873 | 0.55% |
| 0.8976 | 0.8784 | 0.0192 | 0.8341 | 0.8379 | 0.6623 | 0.38% |
| 异常现象 | 异常原因 | 解决措施 |
|---|---|---|
| 检测信号强度过低 | 样品溶解不完全;雾化器效率降低;检测器老化;等离子体功率不足 | 优化样品溶解方法(如碱溶),确保样品完全溶解;检查并清洗或更换雾化器;考虑更换检测器;适当提高等离子体功率 |
| 检测信号强度过高 | 样品污染;标准溶液配制错误;检测器响应异常 | 排查样品污染来源并重新制备样品;重新配制标准溶液并校准;检查检测器,调整其工作参数或进行维修 |
| 波长不准确 | 光学系统元件故障或磨损;温度变化影响光栅性能 | 检查光学系统,维修或更换故障元件;控制仪器环境温度,确保温度稳定 |
| 背景信号过高 | 样品基体干扰严重;连续光谱干扰;散射光干扰 | 采用基体匹配法或内标法降低基体干扰;优化背景校正方法;减少散射光影响,如改善光路设计 |
| 重复性差 | 进样系统不稳定;等离子体参数波动;仪器未充分预热;雾化器残留杂质 | 检查进样系统,确保稳定进样;稳定等离子体参数,如气体流量、功率等;充分预热仪器后再进行测量;清洗或更换雾化器 |
Table 3 Analysis of common faults in ICP-OES detection
| 异常现象 | 异常原因 | 解决措施 |
|---|---|---|
| 检测信号强度过低 | 样品溶解不完全;雾化器效率降低;检测器老化;等离子体功率不足 | 优化样品溶解方法(如碱溶),确保样品完全溶解;检查并清洗或更换雾化器;考虑更换检测器;适当提高等离子体功率 |
| 检测信号强度过高 | 样品污染;标准溶液配制错误;检测器响应异常 | 排查样品污染来源并重新制备样品;重新配制标准溶液并校准;检查检测器,调整其工作参数或进行维修 |
| 波长不准确 | 光学系统元件故障或磨损;温度变化影响光栅性能 | 检查光学系统,维修或更换故障元件;控制仪器环境温度,确保温度稳定 |
| 背景信号过高 | 样品基体干扰严重;连续光谱干扰;散射光干扰 | 采用基体匹配法或内标法降低基体干扰;优化背景校正方法;减少散射光影响,如改善光路设计 |
| 重复性差 | 进样系统不稳定;等离子体参数波动;仪器未充分预热;雾化器残留杂质 | 检查进样系统,确保稳定进样;稳定等离子体参数,如气体流量、功率等;充分预热仪器后再进行测量;清洗或更换雾化器 |
| 参数 | 数值 |
|---|---|
88.213 88.352 986.13 2200.2 0.5 |
Table 4 Binary interaction parameters of NRTL model
| 参数 | 数值 |
|---|---|
88.213 88.352 986.13 2200.2 0.5 |
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