Abstract: A rapid growth of electronics industry in recent years leads to a growing market of electronic gases including ammonia. H2O is the most difficult component to remove among various impurities in the purification of ammonia. The recent progress of production and application of high purity ammonia was reviewed; more specifically, ordinary sorbents, including silica gel, molecular sieves and alumina, as well as sorbents, like getter metal alloys, metal oxides and metal salts, were discussed. Techniques based on chemisorption, physical adsorption and their combination were investigated, together with their adsorption mechanism. Furthermore, the development directions of adsorptive removal of trace water were presented. It can be expected that techniques based on both chemisorption and physical adsorption with regenerable adsorbents with relatively high sorption capacity and fast sorption kinetics are most promising.

Key words: high purity ammonia, purification, adsorption, trace moisture

摘要： 随着近年来电子行业的迅猛发展，对包括高纯氨在内的各种电子气体的需求量与日俱增。在生产高纯氨的工艺中，水分是最难脱除的。本文介绍了国内外高纯氨的生产使用情况，综述了硅胶、分子筛和活性氧化铝等几种常见吸水材料以及金属合金、金属氧化物和金属盐类吸附材料的研究进展，阐述了物理吸附、化学吸附以及二者相结合的吸附工艺的优缺点，探讨了吸附机理。最后对氨气中微量水吸附脱除工艺的发展方向进行了展望，指出采用吸附容量大、吸附深度高并且易于再生的吸附剂的物理、化学吸附相结合的工艺是今后的研究方向。

关键词: 高纯氨, 净化, 吸附, 微量水