CIESC Journal ›› 2017, Vol. 68 ›› Issue (S1): 232-239.DOI: 10.11949/j.issn.0438-1157.20170498

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Depositing mechanism of selective OSP on copper and gold surface of PCB board

XIAO Dingjun1,2, ZHAO Mingyu1, YE Shaoming1, LI Xiaofang1, WANG Chong1,2   

  1. 1. Research & Development Center, Guangdong Toneset Science & Technology Co., Ltd., Guangzhou 510288, Guangdong, China;
    2. Technique Center, Guangdong Guanghua Sci-Tech. Co., Ltd., Shantou 515061, Guangdong, China
  • Received:2017-04-27 Revised:2017-05-17 Online:2017-08-31 Published:2017-08-31
  • Supported by:

    supported by the Science and Technology Program of Guangzhou (2017010160203) and the Guangdong Innovative and Entrepreneurial Research Team Program (201301C0105324342).

选择性有机可焊保护剂在印制电路板铜金表面选择性沉积机理

肖定军1,2, 赵明宇1, 叶绍明1, 黎小芳1, 王翀1,2   

  1. 1. 广东东硕科技有限公司技术开发部, 广东 广州 510288;
    2. 广东光华科技股份有限公司技术中心, 广东 汕头 515061
  • 通讯作者: 叶绍明,ysm@toneset.com
  • 基金资助:

    广州市科技计划项目(2017010160203);广东省引进创新科研团队计划项目(201301C0105324342)。

Abstract:

In order to develop better Cu-Au selective OSP (organic solderability preservatives),the procedure and principle of depositing of several selective OSP on printed circuit board(PCB) were studied for the first time. The mechanism of OSP reaction and selective depositing were investigated with UV thickness measure,SEM morphology survey and EDS element-composing analysis. The results indicate that the complexation reaction between substituted benzimidazole derivatives and copper (Ⅰ) compound needs some activation energy. The copper (Ⅱ) ion,ferric (Ⅲ) ion and benzimidazole all can lower this activation energy and have positive catalytic effect,while the zinc (Ⅱ) ion has no such capacity. Employing the catalytic property and no participating in OSP film formation of the ferric ion can endow OSP the selectivity between copper and gold. And no complexation between benzimidazole and gold atom can also be used to make this kind of selectivity as well. The selective OSP containing zinc ion plus pre-treatment process is obviously better than the selective OSP containing ferric ion. The OSP film formation procedure does not change the surface morphology of copper and gold.

Key words: catalysis, chemical reaction, complexes, deposition, selective, organic solderability preservatives, substituted benzimidazole derivatives

摘要:

通过紫外分析有机可焊保护剂(OSP)膜厚、SEM形貌观察和EDS元素分析等方法研究了不同OSP工艺流程对印制电路板铜金选择性沉积的过程和机理。结果表明:取代苯并咪唑衍生物和1价铜化合物的OSP配合反应需要一定的活化能;2价铜离子、3价铁离子以及苯并咪唑小分子均可以降低该反应的活化能,具有正向催化作用,而锌离子不具备催化OSP反应的能力;利用铁离子的催化特性和不参与成膜的特点可以使OSP在铜、金之间形成选择性,利用苯并咪唑小分子不与金原子络合的特点也可以使OSP在铜、金之间形成选择性;配套预浸前处理的含锌离子OSP体系的选择性显著优于含铁离子OSP体系的选择性;OSP成膜反应不会改变铜表面和金表面的微观形貌。

关键词: 催化, 化学反应, 配合物, 沉积物, 选择性, 有机可焊保护剂, 取代苯并咪唑衍生物

CLC Number: