CIESC Journal ›› 2022, Vol. 73 ›› Issue (8): 3307-3325.DOI: 10.11949/0438-1157.20220583
• Reviews and monographs • Previous Articles Next Articles
Hao CHEN1(), Pengzhong CHEN1,2(), Xiaojun PENG1,3()
Received:
2022-04-24
Revised:
2022-08-04
Online:
2022-09-06
Published:
2022-08-05
Contact:
Pengzhong CHEN, Xiaojun PENG
通讯作者:
陈鹏忠,彭孝军
作者简介:
陈昊(1996—),男,博士研究生,chenhao2019@mail.dlut.edu.com
基金资助:
CLC Number:
Hao CHEN, Pengzhong CHEN, Xiaojun PENG. Metal-based extreme ultraviolet photoresist[J]. CIESC Journal, 2022, 73(8): 3307-3325.
陈昊, 陈鹏忠, 彭孝军. 金属基极紫外光刻胶[J]. 化工学报, 2022, 73(8): 3307-3325.
Environment | D0 × 1016 / (ph/cm2) | D100 × 1016 / (ph/cm2) | D0 /s | D100 /s | γ |
---|---|---|---|---|---|
UHV | 1.4 | 2.7 | 550 | 1100 | 3.3 |
1.2 | 2.2 | 470 | 870 | 3.8 | |
2.1 | 4.0 | 850 | 1600 | 3.7 | |
PMeOH = 1 mbar | 2.5 | 4.1 | 980 | 1700 | 4.4 |
2.0 | 3.4 | 810 | 1400 | 4.4 |
Table1 D0 and D100 values of Keggin-NaSn13 photoresist in five environments
Environment | D0 × 1016 / (ph/cm2) | D100 × 1016 / (ph/cm2) | D0 /s | D100 /s | γ |
---|---|---|---|---|---|
UHV | 1.4 | 2.7 | 550 | 1100 | 3.3 |
1.2 | 2.2 | 470 | 870 | 3.8 | |
2.1 | 4.0 | 850 | 1600 | 3.7 | |
PMeOH = 1 mbar | 2.5 | 4.1 | 980 | 1700 | 4.4 |
2.0 | 3.4 | 810 | 1400 | 4.4 |
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