CIESC Journal ›› 2025, Vol. 76 ›› Issue (4): 1820-1830.DOI: 10.11949/0438-1157.20241135
• Material science and engineering, nanotechnology • Previous Articles Next Articles
Yingdong ZHAO1(), Peijun JI2(
), Riyao CONG1, Haichao FU3, Jialong ZHANG2(
), Pengzhong CHEN1(
), Xiaojun PENG1(
)
Received:
2024-10-14
Revised:
2024-11-30
Online:
2025-05-12
Published:
2025-04-25
Contact:
Jialong ZHANG, Pengzhong CHEN, Xiaojun PENG
赵英东1(), 姬沛君2(
), 丛日尧1, 付海超3, 张家龙2(
), 陈鹏忠1(
), 彭孝军1(
)
通讯作者:
张家龙,陈鹏忠,彭孝军
作者简介:
赵英东(1998—),男,博士研究生,billzyd@mail.dlut.edu.cn基金资助:
CLC Number:
Yingdong ZHAO, Peijun JI, Riyao CONG, Haichao FU, Jialong ZHANG, Pengzhong CHEN, Xiaojun PENG. Preparation and high-resolution lithography study of organic tin photoresists containing acrylates[J]. CIESC Journal, 2025, 76(4): 1820-1830.
赵英东, 姬沛君, 丛日尧, 付海超, 张家龙, 陈鹏忠, 彭孝军. 丙烯酸配位有机锡光刻胶的制备及高分辨光刻研究[J]. 化工学报, 2025, 76(4): 1820-1830.
Fig.1 (a) The synthesis route of Sn1Ac; (b) The morphology image of Sn1Ac crystal under a microscope; (c) The crystal structure viewed along the a-axis and b-axis; (d) Powder XRD patterns; (e) IR transmission spectra; (f) Thermogravimetric analysis and differential scanning calorimetry curves
Fig.2 (a) PMorphology of Sn1Ac alone and Sn1Ac+PETM and morphology of spin-coated film; (b) The film thickness tests before and after vacuum treatment; (c) Hirshfeld surface analysis diagram and (d) 2D fingerprintingspectrum; (e) Theoretical calculations of intermolecular hydrogen bonds; (f) Infrared spectral analyses of Sn1Ac, PETMP and Sn1Ac+PETMP
Fig.6 Optical microscopy and AFM of Sn1Ac+PETMP and Sn1Ac films exposed to deep UV for 30 and 60 min followed by development (LW, Th, and RMS represent the line width, thickness, and surface roughness of the line patterns, respectively)
Fig.7 (a) Real-time dielectric monitoring during exposure; (b) Infrared spectra obtained before and after exposure; (c) Relative contents of carbon, oxygen, and sulfur at different exposure doses; (d) Binding energies of Sn 3d5/2 at different exposure doses; XPS spectrum of O 1s before (e) and after (f) exposure; (g) The changes in chemical state content of O at different exposure doses; XPS spectrum of S 2p before (h) and after (i) exposure; (j) The changes in chemical state content of S at different exposure doses
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