水平管环状流液膜厚度与波动参数分布

doi:10.11949/j.issn.0438-1157.20190388

摘要/Abstract

摘要：

环状流是常见的一种气液两相流流型，基于双平行电导探针阵列传感器设计了环状流液膜动态测量系统，以水和空气为介质，进行了气相表观流速15~35 m/s、液相表观流速0.1~0.4 m/s范围内的水平管环状流周向液膜测量实验，分析了水平管环状流的液膜厚度、相界面波动参数的空间分布与发展变化规律。结果表明，水平管环状流底部液膜厚度随气相表观流速的增加而减小，随液相表观流速的增加而增大，但在高液相表观流速时有饱和趋势，对应条件下周向其他位置的液膜厚度持续增大，尤其在45°位置显著增大，下半周液膜分布趋于平缓；由底部到顶部，液膜波速和波频在周向上均呈逐渐减小趋势，与液膜厚度的分布规律一致，大幅度的扰动波主要分布在底部；底部液膜波速和波频随气相表观流速增加而增大，液相表观流速增加时，波速随之增大，但波频无明显变化，对应波长增大。

关键词: 环状流, 双平行电导探针, 液膜厚度, 界面, 波频, 波速, 分布

Abstract:

Annular flow is a common type of gas-liquid two-phase flow. A dynamic measurement system for annular flow liquid film with double parallel conductance probes array sensor is designed. The experiments in horizontal annular flow with superficial gas velocity of 15－35 m/s and superficial liquid velocity of 0.1－0.4 m/s are carried out. And the distribution of liquid film thickness and phase interface wave parameters in horizontal annular flow is analyzed. The results show that the bottom liquid film thickness decreases with the increase of the superficial gas velocity, and increases with the increase of the superficial liquid velocity in the horizontal annular flow. But there is a saturated growth trend at high superficial liquid velocity. Meanwhile, the liquid film thickness at other circumferential positions increases continuously, especially at 45° position. And the distribution of liquid film tends to be uniform at the lower halve circumference. From the bottom to the top, the wave velocity and wave frequency of the circumferential liquid film decrease gradually, which is consistent with the distribution of the liquid film thickness. The large disturbance wave mainly distributes at the bottom. The wave velocity and wave frequency of the bottom liquid film increase with the increase of the superficial gas velocity. However, the influence of the superficial liquid velocity to wave velocity and wave frequency is different. With the increase of superficial liquid velocity, the wave velocity increases, but the wave frequency almost unchanged, and the wavelength increases correspondingly.

Key words: annular flow, conductance probes array, liquid film thickness, interface, wave frequency, wave velocity, distributions

中图分类号:

O 359⁺.1

孙宏军, 王伟, 桂明洋. 水平管环状流液膜厚度与波动参数分布[J]. 化工学报, 2019, 70(11): 4162-4171.

Hongjun SUN, Wei WANG, Mingyang GUI. Distribution of liquid film thickness and wave parameters in horizontal annular flow[J]. CIESC Journal, 2019, 70(11): 4162-4171.

图/表 15

图1 双闭环湿气实验装置

Fig.1 Flow loops of wet gas experimental setup

图2 双平行电导探针阵列传感器及探针周向分布方式

Fig.2 Double parallel conductance probe and distribution of circumferential probe

图3 液膜测量系统

Fig.3 Measurement system of liquid film

图4 修正的Baker流型图及实验数据

Fig.4 Modified Baker flow pattern map and experimental data

图5 静态标定与拟合结果

Fig.5 Static calibration and fitting

图6 不同气相表观流速下底部液膜时序信号(红色为上游信号，黑色为下游信号)

Fig.6 Time-domain signals of bottom liquid film at different superficial gas velocity(red for upstream signal, black for downstream signal)

图7 底部液膜厚度随液相表观流速的变化

Fig.7 Variation of bottom liquid film thickness with superficial liquid velocity

图8 45°位置液膜厚度测量结果

Fig.8 Measurement results of liquid film thickness at 45°

图9 周向液膜厚度分布 (usl = 0.254 m/s)

Fig.9 Distribution of circumferential liquid film thickness (usl = 0.254 m/s)

图10 周向平均液膜厚度分布

Fig.10 Distribution of circumferential average liquid film thickness

图11 周向波速分布 (usg= 26 m/s, usl = 0.311 m/s)

Fig.11 Distribution of circumferential wave velocity (usg= 26 m/s, usl = 0.311 m/s)

图12 波速随液相表观流速的变化

Fig.12 Variation of wave velocity with superficial liquid velocity

图13 周向波频分布 (usg= 22 m/s, usl = 0.311 m/s)

Fig.13 Distribution of circumferential wave frequency (usg= 22 m/s, usl = 0.311 m/s)

图14 不同气相表观流速下的波频特性

Fig.14 Wave frequency characteristics at different superficial gas velocity

图15 不同液相表观流速下的波频特性

Fig.15 Wave frequency characteristics at different superficial liquid velocity

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