关键词: 高纯氨, 净化, 吸附, 微量水

Abstract: A rapid growth of electronics industry in recent years leads to a growing market of electronic gases including ammonia. H2O is the most difficult component to remove among various impurities in the purification of ammonia. The recent progress of production and application of high purity ammonia was reviewed; more specifically, ordinary sorbents, including silica gel, molecular sieves and alumina, as well as sorbents, like getter metal alloys, metal oxides and metal salts, were discussed. Techniques based on chemisorption, physical adsorption and their combination were investigated, together with their adsorption mechanism. Furthermore, the development directions of adsorptive removal of trace water were presented. It can be expected that techniques based on both chemisorption and physical adsorption with regenerable adsorbents with relatively high sorption capacity and fast sorption kinetics are most promising.

Key words: high purity ammonia, purification, adsorption, trace moisture