CIESC Journal ›› 2018, Vol. 69 ›› Issue (8): 3717-3723.DOI: 10.11949/j.issn.0438-1157.20180070

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Crystal structures, electronic structures and conductivity of Si highly doped RuO2

LI Guorong1, ZOU Xiangda2, WANG Qifan1, WANG Xin1, TANG Zhongzhi2, ZHOU Yangjie2,3, TANG Dian1,2   

  1. 1 College of Materials Science and Engineering, Fuzhou University, Fuzhou 350108, Fujian, China;
    2 Institute of Materials Research, Fuzhou University, Fuzhou 350216, Fujian, China;
    3 Fujian Institute of Metallurgical Engineering, Fuzhou 350111, Fujian, China
  • Received:2018-01-28 Revised:2018-04-25 Online:2018-08-05 Published:2018-08-05
  • Supported by:

    supported by the National Natural Science Foundation of China (11374053) and the Fujian Provincial Education Department (JK2017005).

高Si掺杂RuO2材料的晶体结构、电子结构和导电性

李国荣1, 邹翔达2, 王启凡1, 王欣1, 唐中帜2, 周扬杰2,3, 唐电1,2   

  1. 1 福州大学材料科学与工程学院, 福建 福州 350108;
    2 福州大学材料研究所, 福建 福州 350216;
    3 福建省冶金研究所, 福建 福州 350111
  • 通讯作者: 王欣
  • 基金资助:

    国家自然科学基金项目(11374053);福建省教育厅高校专项项目(JK2017005)。

Abstract:

The first-principle method based on the density functional theory(DFT) was performed to investigate the crystal structural characteristics of highly Si-doped (Ru1-xSix)O2 (x=0,0.125,0.25,0.375 and 0.5). The phase analysis of Si-doped RuO2 evidently proves that the high concentrated Si solid solutions are achieved by thermal decomposition with proper annealing process. The band structures show that the highly Si-doped RuO2 always maintains metallic nature. The density of states suggests that the electrical conductive-hosts originate from Ru-4d and O-2p electrons, along with small amount Si-3p electrons. The descending of electrical conductivity of Si-doped (Ru1-xSix)O2 abides by the single exponential attenuation trend with increasing Si doping.

Key words: silica, RuO2, catalyst, computer simulation, crystal structure, electronic structure, conductivity

摘要:

通过密度泛函理论(density functional theory,DFT)的第一性原理,研究了高Si掺杂的(Ru1-xSix)O2x=0、0.125、0.25、0.375、0.5)固溶体材料的晶体结构特征;对采用热分解制备的Si掺杂RuO2的相分析,证实了通过合适的热分解工艺,可以实现高浓度Si的代位掺杂;能带结构研究显示,高Si掺杂RuO2材料始终保持金属特性;态密度分析表明,Si可以提供少许Si-3p电子,但导电主体仍来自Ru-4d与O-2p电子;高Si掺杂(Ru1-xSix)O2的电导率随Si掺杂量的变化符合一阶指数衰减趋势。

关键词: 二氧化硅, 二氧化钌, 催化剂, 计算机模拟, 晶体结构, 电子结构, 导电性

CLC Number: